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dc.creatorKarakasidis, T. E.en
dc.creatorEvangelakis, G. A.en
dc.date.accessioned2015-11-23T10:33:04Z
dc.date.available2015-11-23T10:33:04Z
dc.date.issued1999
dc.identifier10.1016/s0039-6028(99)00662-7
dc.identifier.issn0039-6028
dc.identifier.urihttp://hdl.handle.net/11615/28978
dc.description.abstractWe present results concerning the cation vacancy diffusion mechanisms occurring on the NiO(001) surface along with their corresponding migration energies. Using a rigid ion potential and molecular dynamics simulations we found that the cation vacancy diffusion is the main diffusion process in this surface employing the simple and two different double hopping mechanisms. Although the hopping rates of the latter are about two times lower than that of simple jumps, at high temperatures their contribution to the total vacancy diffusion coefficient is comparable with that of simple jumps. In addition, for all mechanisms saturation is found in the Arrhenius diagrams above a temperature T-s = 2850 K. We attributed this behavior to collective and correlated movements of the surface atoms that are activated from multi-phonon processes taking place above T-s. Similar behavior was found recently in the case of metals. (C) 1999 Published by Elsevier Science B.V. All rights reserved.en
dc.source.uri<Go to ISI>://WOS:000082456200037
dc.subjectcation vacancyen
dc.subjectdiffusion and migrationen
dc.subjectmolecular dynamicsen
dc.subjectnickelen
dc.subjectoxideen
dc.subjectsingle crystal surfaceen
dc.subjectsurface diffusionen
dc.subjectSELF-DIFFUSIONen
dc.subjectNICKEL-OXIDEen
dc.subjectADATOM DIFFUSIONen
dc.subjectGRAIN-BOUNDARYen
dc.subjectDOUBLEen
dc.subjectJUMPSen
dc.subjectALUMINAen
dc.subjectCOPPERen
dc.subjectLAYERSen
dc.subjectMGOen
dc.subjectChemistry, Physicalen
dc.subjectPhysics, Condensed Matteren
dc.titleCation vacancy diffusion on the NiO(001) surface by molecular dynamics simulationsen
dc.typejournalArticleen


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