On the nanocrystalline structure of TiC and TiB2 produced by laser ablation

dc.creator	Zergioti, I.	en
dc.creator	Haidemenopoulos, G. N.	en
dc.date.accessioned	2015-11-23T10:54:54Z
dc.date.available	2015-11-23T10:54:54Z
dc.date.issued	1997
dc.identifier	10.1016/s0965-9773(97)81417-1
dc.identifier.issn	0965-9773
dc.identifier.uri	http://hdl.handle.net/11615/34872
dc.description.abstract	Thin films of TiC and TiB2 have been deposited on silicon substrate by pulsed laser deposition technique, under substrate temperatures 25 - 600 degrees C. Transmission electron microscopy revealed the nanocrystalline structure of the coatings. The grain size for the TiC film was between 10 and 70 nm and for the TiB2 film was between 10 and 50 nm.	en
dc.source.uri	<Go to ISI>://WOS:A1997WP91400006
dc.subject	CHEMICAL VAPOR-DEPOSITION	en
dc.subject	TITANIUM CARBIDE	en
dc.subject	THIN-FILMS	en
dc.subject	BEHAVIOR	en
dc.subject	CORROSION	en
dc.subject	Materials Science, Multidisciplinary	en
dc.title	On the nanocrystalline structure of TiC and TiB2 produced by laser ablation	en
dc.type	journalArticle	en

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